12th International Workshop on Plasma Based Ion Implantation and Deposition

›8:40 (1h35)

Alternative & Hybrid Processes
M. Ueda, M.-L. David

› IFMI Amphitheatre

8:40 - 10:15 (1h35)

Alternative & Hybrid Processes

IFMI Amphitheatre

M. Ueda, M.-L. David

› Surface modification of materials by cold atmospheric plasma (Invited talk) - Konstantin G. Kostov, Universidade Estadual Paulista 08:40-09:15 (35min)

› Numerous impacts of energetic fullerene clusters on silicon crystal surface: modification features - Vasily Lavrentiev, Nuclear Physics Institute AS CR 09:15-09:35 (20min)

› Duplex surface treatments combining surface mechanical attrition treatment (SMAT) and low temperature plasma nitriding - Mahdi CHEMKHI, University of Technology of Troyes 09:35-09:55 (20min)

› Kinetics of hydrogen interaction with a-Si:H based thin films and structures : In situ ellipsometry investigation - Aomar HADJADJ, Laboratoire d'Ingénierie et Sciences des Matériaux 09:55-10:15 (20min)

›10:15 (30min)

Coffee break

› IFMI Hall

10:15 - 10:45 (30min)

Coffee break

IFMI Hall

›10:45 (1h55)

Industrial Applications, Scaling Issues
A. Anders, M. Drouet

› IFMI Amphitheatre

10:45 - 12:40 (1h55)

Industrial Applications, Scaling Issues

IFMI Amphitheatre

A. Anders, M. Drouet

› Plasma Immersion Ion Implantation for Semiconductor Industries: Specific Challenges and Example of Applications for Advanced Devices (Invited talk) - Yohann Spiegel, Ion Beam Services 10:45-11:20 (35min)

› HiPIMS deposition of oxide thin films for solid oxide fuel cells - Steffen Sønderby, Tribology Centre, Danish Technological Institute, Thin Film Division, Department of Physics, Chemistry, and Biology, Linköping University 11:20-11:40 (20min)

› Multidimensional depth profile analysis of Plasma Coatings by Plasma Profiling Techniques, GD OES and PP TOFMS - Patrick Chapon, Horiba Jobin Yvon 11:40-12:00 (20min)

›12:40 (1h35)

Lunch

12:40 - 14:15 (1h35)

Lunch

›14:15 (2h15)

Posters session B

› IFMI - Rooms A & B

14:15 - 16:30 (2h15)

Posters session B

IFMI - Rooms A & B

› Atomic-layer thinning of graphene with low energy helium plasma implantation - Wei Luo, Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences 14:15-16:30 (2h15)

› Bioactive layers grown by MAO on nitrogen plasma treated titanium with improved tribo-mechanical features - Gelson de Souza, Universidade Estadual de Ponta Grossa 14:15-16:30 (2h15)

› Cellular reponses to titanium successively treated by magnesium and silver PIII&D - Huiliang Cao, State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences 14:15-16:30 (2h15)

› Characterization of Plasma Density and Ion Energy in Ribbon-like Cathodic Arc Plasma Magnetic Filter - Hongtao Liu, Beihang University 14:15-16:30 (2h15)

› Characterization of the expanded austenite formed on a AISI 316 L stainless steel by plasma nitriding - MOURAD KEDDAM, Laboratoire de Technologie des Matériaux - Département Science des Matériaux 14:15-16:30 (2h15)

› Drug release In Ti-15Mo alloy after plasma deposition associated biomimetic surface treatment - André Luiz Reis Rangel, Faculdade de Engenharia de Guaratinguetá - Universidade Estadual Paulista - Ana Paula Rosifini Alves Claro, Faculdade de Engenharia de Guaratinguetá - Universidade Estadual Paulista 14:15-16:30 (2h15)

› Effect of argon ion implantation on the properties of plasma-polymerized acetylene films - Deborah Santos, CEETEPS - Faculty of Technology 14:15-16:30 (2h15)

› Effect of Plasma Immersion Ion Implantation (PIII) with Different Gases on the Surface Properties of Carbon Fibers - Leide da Silva, Technological Faculty in Pindamonhangaba, Universidade Estadual Paulista 14:15-16:30 (2h15)

› Effect of residual stress on the ionic conductivity of yttria stabilized zirconia nano-films - J.S. CHERNG, Department of Materials Engineering, Ming Chi University of Technology 14:15-16:30 (2h15)

› Estimation of the effective boron diffusion coefficient in Fe2B and modeling of the growth kinetics of boride layers by the artificial neural network approach and the regression model - MOURAD KEDDAM, Laboratoire de Technologie des Matériaux - Département de Sciences des Matériaux 14:15-16:30 (2h15)

› Films Deposited from Red Mud by PIIID - Maria Lúcia Antunes, Universidade Estadual Paulista Julio de Mesquita Filho - Elidiane Rangel, Universidade Estadual Paulista Julio de Mesquita Filho - Nilson Cruz, Univ Est Paulista 14:15-16:30 (2h15)

› Graphite-like carbon films by high power impulse and direct-current magnetron sputtering - Meidong Huang, College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300387, China 14:15-16:30 (2h15)

› Improved adhesion of DLC films on copper substrates by preimplantation - Stefan Flege, Technische Universitaet Darmstadt 14:15-16:30 (2h15)

› Influence of Ar/C2H2 ratio on structure and properties of Cr-DLC films deposited on stainless steels by high power pulsed magnetron sputtering - Chunzhi Gong, State Key Lab. of Advanced Welding & Joining, Harbin Institute of Technology 14:15-16:30 (2h15)

› INFLUENCE OF GRAIN ORIENTATION ON RADIATION INDUCED STRAINS IN UO2 POLYCRYSTALS - Philippe Goudeau, Institut Pprime 14:15-16:30 (2h15)

› Influence of ion-implantation on thermoluminescence of synthetic quartz - Nsengiyumva Schadrack, Rhodes University 14:15-16:30 (2h15)

› Influence of the Concentration of OH Radicals on the Growth of Hydroxyapatite on Titanium Samples Treated by PBII&D - Rita de Cássia Rangel, Paulista State University 14:15-16:30 (2h15)

› Influence of the magnetic field on DLC coatings grown by plasma immersion ion implantation and deposition - Mario Ueda, Associated Laboratory of Plasma, National Institute for Space Research, S. J. Campos, S. Paulo, Brazil 14:15-16:30 (2h15)

› Ion implantation effect on Fe2O3 by low energy deuterium ion exposure - Yasuhiro Sakuma, Nagoya University 14:15-16:30 (2h15)

› Low energy plasma immersion ion implantation for controlling the wettability of propylene - Elidiane Rangel, Universidade Estadual Paulista 14:15-16:30 (2h15)

› Low temperature ultra-thin silicon oxide fabricated by plasma immersion ion implantation - Shay Reboh, Laboratoire d'Electronique et des Technologies de l'Information 14:15-16:30 (2h15)

› Microstructures and Mechanical properties of Ti/TiC/Ti-DLC films deposited by hybrid High-power Magnetron sputtering (HPPMS) - W. W. Sun, State Key Lab. of Advanced Welding & Joining - Xiubo Tian, State Key Lab. of Advanced Welding & Joining 14:15-16:30 (2h15)

› Modeling plasma sprayed nanostructured Al2O3–13wt%TiO2 coatings - KRIBAA Rafika Ilhem, Kribaa 14:15-16:30 (2h15)

› Nanostructure formation and improved surface hardness of hypereutectic Al-17.5Si alloy induced by high current pulsed electron beam treatment - Bo Gao, Northeastern University 14:15-16:30 (2h15)

› Preparation of diamond-like carbon films by double cathodes pulse glow discharge plasma vapor deposition - Fazhan Yang, The Engineering & technical College of Chengdu University of Technology, Southwestern Institute of Physics 14:15-16:30 (2h15)

› Stress influence on the orientation of planar defects in Silicon - Maxime Vallet, Institut Pprime 14:15-16:30 (2h15)

› Structural and tribo-mechanical characterization of nitrogen plasma treated titanium for bone implants - Gelson de Souza, Universidade Estadual de Ponta Grossa - Carlos Foerster, Universidade Estadual de Ponta Grossa 14:15-16:30 (2h15)

› Structural Modification of Carbon Fibers by Plasma Immersion Ion Implantation (PIII) and Atmospheric Dielectric Barrier Discharge (DBD) – a Comparison - Konstantin Kostov, Universidade Estadual Paulista, São Paulo State University 14:15-16:30 (2h15)

› STUDY OF FILMS PRODUCED BY PIIID OF HEXAMETHYLDISILAZANE-ARGON MIXTURE. - Rogério Mota, São Paulo State University - Konstantin Kostov, São Paulo State University - Felipe Kodayra, São Paulo State University 14:15-16:30 (2h15)

› Study of morphology and stability of Al2O3 washcoat prepared by plasma spraying technique - Samson H. S. Cheng, Department of Physics and Materials Science, City University of Hong Kong 14:15-16:30 (2h15)

› The Behavior of ion current in the high-power pulsed sputtering Penning discharge plasma device. - Azuma Kingo, University of Hyogo 14:15-16:30 (2h15)

› The characteristics of hundred-mm cylindrical anode layer Hall plasma accelerator by experiments and three-dimensional particle in cell numerical investigation - Rick K. Y. Fu, Plasma Technology Limited 14:15-16:30 (2h15)

› Thin and Thick Films of TiO2 by RF Inductive Plasmas Sputtering - RAUL VALENCIA-ALVARADO, Instituto Nacional de Investigaciones Nucleares 14:15-16:30 (2h15)

› Tribological properties of diamond-like carbon coatings deposited using unbalanced magnetron sputtered with various tungsten filament currents - W. H. Kao, Institute of Mechatronoptic Systems, Chienkuo Technology University, Changhua, Taiwan. 14:15-16:30 (2h15)

› ZnO Gas Sensor Prepared by Plasma Based Ion Implantation - Mário Ueda, National Institute for Space Research 14:15-16:30 (2h15)

›17:00 (30min)

Coach transportation to Poitiers Downtown

17:00 - 17:30 (30min)

Coach transportation to Poitiers Downtown

A coach will be available at 17:00 to transport participants from the workshop/hotels area to the downtown of Poitiers.

›17:30 (2h30)

Poitiers city visit

17:30 - 20:00 (2h30)

Poitiers city visit

›20:00 (30min)

Coach transportation

20:00 - 20:30 (30min)

Coach transportation

Coach transportation from Poitiers downtown to the banquet place: Le Clos de la Ribeaudière

›20:30 (2h30)

Banquet

› Restaurant Le Clos De La Ribaudière

20:30 - 23:00 (2h30)

Banquet

Restaurant Le Clos De La Ribaudière

›23:00 (30min)

Coach transportation

23:00 - 23:30 (30min)

Coach transportation

Coach transportation from the banquet place to the hotels Plazza and Altéora