Accepted abstracts by author > Duchaine Julian


Low temperature ultra-thin silicon oxide fabricated by plasma immersion ion implantation Julian Duchaine, Shay Reboh, Frank Torregrosa, Fréderic Mazen, Fréderic Milesi sciencesconf.org:pbiid2013:14507
Plasma Immersion Ion Implantation for Semiconductor Industries: Specific Challenges and Example of Applications for Advanced Devices (Invited talk) Yohann Spiegel, Frank Torregrosa, Julian Duchaine, Laurent Roux sciencesconf.org:pbiid2013:14541

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