Accepted abstracts by author > Gui Gang

In this paper, Cr-DLC films were deposited on stainless steels and Si(100) substrate by hybrid high power pulsed magnetron sputtering (HPPMS) manufactured by our group. The power supply can deliver the maximum pulsed current of 2kA. Magnetron discharge is excited using chromium in the mixture atmosphere of Ar and C2H2 and microstructure and surface properties of the films prepared with different Ar/C2H2 ratio were investigated. The experimental results showed the dense and smooth Cr-DLC films with the thickness of about 2μm were fabricated by HPPMS. The mean surface roughness of the films decreased with C2H2 flow rate increasing. The Raman spectra suggested that DLC was formed. With the increase of the C2H2 flow, ID / IG decreased and the content of sp3 increased at the flow of C2H2 form 2.5sccm to 7.5sccm. Chromium carbide was formed in the films with Cr3C2 (215) preferred orientation. XPS demonstrated that the elements of Cr, C and O were included and Cr mainly existed in the form of Cr atoms and Cr3C2. The nano-hardness of the Cr-DLC films ranged from 20GPa to 26GPa. And the films exhibited excellent wear resistance with minimum friction coefficient of 0.1, good adhesion between the films and substrate with the critical load of 38N.